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Microelectronics Science & Technology (MST) Symposium |
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U.S. |
Korea |
Symposium
Co-Chairs |
Kang-Wook Lee (IBM) (kwlee@us.ibm.com)
Bongtae Han (U MD)
Dae-Young Jung (IBM)
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Kyung W. Paik (KAIST)
Young Ho Kim (Hanyang U)
Koeng Su Lim (KAIST) |
Symposium
Advisory
Committee |
Jang-Hi Im (UT Austin)
Sung-Kwon Kang (IBM)
Yeong J. Lee (Motorola)
Sung Yi (Portland St Univ)
Chris Scanlan (VP, Amkor)
Steve Buchwalter (IBM)
Jung Yoon (IBM)
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Jin Yu (KAIST)
Jungihl Kim (Anam)
Seyong Oh (Samsung Elc)
Y. Eugene Pak (Samsung CT)
Changyoul Moon (SAIT)
Yong Soo Cho (Yonsei Univ) |
Symposium
Program
Committee |
Seungbae Park
(SUNY)
Myung-Jin Yim (Georgia Tech)s |
Won-Kyoung Choi
(SAIT)
Ho-Jung Chang (Dankook Univ)
Tae-Sung Oh (Hongik Univ)
Yoon Dong Park (SAIT)
Hyung Choi (SAIT)
Chan Bong Jun (SAIT)
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It is encouraged that most co-chairs and committee members
present a talk.
- Dinner with MST speakers and organizers:
Aug. 10 (Thurs), 2006
- Number of verbal presentations: 28-36
- Net duration of symposium: approximately
12 hr
- Duration of a talk: 20-30 min depending
on the number of talks
- Topics of particular interest include but not
limited to:
(1) Materials, processes and reliabilities of electronic
packages
a. Dielectric materials
b. Pb-free solders
c. Flip chip bumping and metallization
d. Thermal interface materials
e. Underfill materials
f. Surfaces and interfaces
g. Reliability testing and modeling
(2) Materials, processes and reliabilities of semiconductors
a. Substrate materials (SOI, strained
Si, hybrid, SiGe)
b. Silicon nanoelectronics
c. High k dielectrics and contact
metals for FEOL
d. Thin film materials and their
deposition (CVD, PVD, ALD)
e. RIE and CMP processes
f. Device characteristics
g. Low k dielectrics and processing
for BEOL
h. FEOL and BEOL integration
i. Chip and packaging interaction
- Contact:
• Kang-Wook Lee kwlee@us.ibm.com
• Bongtae Han bthan@eng.umd.edu
• Dae-Young Jung jungdy@us.ibm.com
• Kyung W. Paik kwpaik@kaist.ac.kr
• Young Ho Kim kimyh@hanyang.ac.kr
• Koeng Su Lim kslim@ee.kaist.ac.kr
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